فهرست نشریات علمی دسترسی آزاد ایران

Thin films of Nickel oxide were successfully deposited at different substrate temperatures (440, 460, 480, and 500 oC), solution volumes (50, 100, 150, and 200 ml), and spray rates (1, 2.5, 5, and 7.5 ml/min) on soda-lime glass substrates using NiCl2.6H2O as a precursor at a concentration of 0.1 M and the spray pyrolysis technique. The structural, optical, and electrical properties of the thin films were characterized. They show a polycrystalline nature with a cubic structure of single-phase NiO and peaks related to (111), (200), and (220) with a preferential orientation along (111). The morphology of NiO thin films resembles that of spherical grains on the entire surface and an average roughness ranging from 28.71 to 84.54 nm. It depends on the deposition conditions. The absorption coefficient, refractive index, extinction coefficient, dielectric constants and optical conductivity were all calculated in the range of (300 and 1100 nm). The range of optical gap, Urbach energy, electrical resistivity, carrier concentration, and carrier mobility were measured to be 2.66 to 3.49 eV, 0.41 to 0.6 eV, 1.33×103 to 2.96×103 Ω.cm, 1.42×1014 to 3.64×1014 cm-3, and 8.21 to 24.25 cm2/v.s, respectively, as a function of deposition conditions. As the Hall effect studies showed, the films exhibited p-type conductivity.